Vacuum deposition

In 2007 in the frame of internal investments the Company has purchased at the «Torr International» (USA) a complex facility for vacuum deposition of thin dielectric and metal films onto surfaces of active elements for optoelectronic devices by thermal, magnetron and E-beam sputtering.

 

Equipment is using for deposition of metal electrodes onto surfaces of active elements for electro-optic and acousto-optic laser radiation control devices as well as AR coatings onto surfaces of optical elements and fabrication of multilayer dielectric mirrors and interference filters.

 

Laboratory is located in class «1000» clean room.

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